多束電子源設(shè)計(jì)與實(shí)驗(yàn)

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Design and experiment of multi-beam electron source

ZHAO Weixia 1，2. ，BAI Lingchao 1，3 ，ZHANG Lixinl*，LIU Junbiao 1，2 ， YIN Bohua 1，2 ，HAN Li [1，2

（1. Research Department ofMicro-nano Fabrication Technology and Intelligent Electronic Devices， Institute of Electrical Engineering，Chinese Academy of Sciences，Beijing lOol9o， China;

2. School of Electronic， Electrical and Communication Engineering， University of Chinese Academy ofSciences，Beijing 1OOo49，China;

3. School of Instrument Science and Optoelectronics Engineering， Beijing Information Science and Technology University，Beijing l0ol92，China） * Corresponding author，E-mail： zhanglx@mail. iee. ac. cn

Abstract： To enhance the throughput of single-beam devices， such as scanning electron microscopes，a multi-beam electron source system utilizing a Schottky gun was developed. This study encompasses the design methodologies and fabrication processes for the collimator lens，aperture array，and micro-arrayed electrostatic lenses.The electrostatic colimator lens was designed based on the emission characteristics of the Schottky cathode，and the performance of the collimated beam was subsequently calculated.Aperture arrays，including configurations of 3×3 and 10×10 for beam splitting，were fabricated utilizing MEMS technology，and a high-precision assembly system was established to enable the assembly of micro-arrayed electrostatic lenses. Experiments concerning beam collimation，splitting，and focusing were conducted on a dedicated multi-beam electron source experimental platform，validating the performance of the 1 tibeam electron soure. Experimental results indicate that the collimated spot size was measured to be 600 （204號(hào) μm with a beam current density of 4.11A/m2 and a uniformity of 6.06% . The average diameter of the focused beamlet is recorded at ，accompanied by size uniformity of 5.91% ，intensity uniformity of （204號(hào) 4.36% ，and pitch uniformity of 3.06% ，all of which meet the design criteria of the multi-beam setup.

Key words： electron optics；multi-beam electron source； Schottky emission；colimator lenses；micro-arrayed einzel lens

1引言

掃描電子顯微鏡（ScanningElectronMicroscope，SEM）自1942年問(wèn)世以來(lái)，推動(dòng)了生物學(xué)、材料學(xué)、化學(xué)、半導(dǎo)體等行業(yè)的發(fā)展。（剩余12579字）